- Deep X-ray lithography
- LIGA process lithography steps
The standard mask layout area is 75mm in diameter.
Masks required in the XRL process can be fabricated based on user CAD layouts utilizing SyLMAND’s in-house mask making technology. Alternatively, a wide variety of user-owned XRL masks can be applied at SyLMAND.
|Polymer||Poly methyl methacrylate (PMMA) (Molecular weight = 1.6M )|
|Minimum Feature size||Dependent on design and polymer thickness|
|Polymer Thickness||100 μm to 1 mm|
|Clean Room Capabilities||
Purchased access offers quick and accurate solutions to proprietary questions. CLS scientists develop an experimental plan based on the client’s needs, and conduct all data collection and analysis, resulting in a detailed report with key answers to critical questions.
Academic clients can submit proposals through a peer review process. Beam time is granted based on scientific merit, with the expectation that any results will be published. In special cases, rapid access is also available for instrument or beam time.