SyLMAND - Synchrotron Laboratory for Micro And Nano Devices

SyLMAND consists of a dedicated x-ray lithography beamline and pre- and post-processing laboratories in a cleanroom environment.

Spectral Range

1 - 15 keV

Techniques

Microfabrication

  • Deep X-ray lithography
  • LIGA process lithography steps

Samples

The standard mask layout area is 75mm in diameter.

Masks required in the XRL process can be fabricated based on user CAD layouts utilizing SyLMAND’s in-house mask making technology. Alternatively, a wide variety of user-owned XRL masks can be applied at SyLMAND.

lithography-mask_pic_mounted_graphite.jpg

Specifications

CLS Port 05B2-1
Polymer Poly methyl methacrylate (PMMA) (Molecular weight = 1.6M )
Minimum Feature size Dependent on design and polymer thickness
Polymer Thickness 100 μm to 1 mm
Clean Room Capabilities
  • Titanium seed layer application on substrate by sputtering
  • PMMA application and customization of thickness
  • Post-exposure development
  • Inspection and imaging capabilities (optical and scanning electron microscopes with measurement tools)
  • Metrology (Surface profiling and Z-tip)
  • UV primary mask patterning and stand alone UV lithography

Contacts

Tyler Morhart Associate Scientist, Beamline Responsible (SyLMAND)


David Klymyshyn SyLMAND Beamline Advisory Team Leader
Sven Achenbach SyLMAND Beamline Advisory Team Leader


Visit the SyLMAND website for a full list of beamline contacts.

Full Contact List

Garth Wells, Sven Achenbach, David Klymyshyn
L-R: Garth Wells, Sven, and David

Access

Purchased Access

Purchased access offers quick and accurate solutions to proprietary questions. CLS scientists develop an experimental plan based on the client’s needs, and conduct all data collection and analysis, resulting in a detailed report with key answers to critical questions.

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Peer-Reviewed Access

Academic clients can submit proposals through a peer review process. Beam time is granted based on scientific merit, with the expectation that any results will be published. In special cases, rapid access is also available for instrument or beam time.

Proposal Submission