Canadian Light Source

Spectral Range

1 - 15 keV



  • Deep X-ray lithography
  • LIGA process lithography steps


The standard mask layout area is 75mm in diameter.

Masks required in the XRL process can be fabricated based on user CAD layouts utilizing SyLMAND’s in-house mask making technology. Alternatively, a wide variety of user-owned XRL masks can be applied at SyLMAND.



CLS Port 05B2-1
Polymer Poly methyl methacrylate (PMMA) (Molecular weight = 1.6M )
Minimum Feature size Dependent on design and polymer thickness
Polymer Thickness 100 μm to 1 mm
Clean Room Capabilities
  • Titanium seed layer application on substrate by sputtering
  • PMMA application and customization of thickness
  • Post-exposure development
  • Inspection and imaging capabilities (optical and scanning electron microscopes with measurement tools)
  • Metrology (Surface profiling and Z-tip)
  • UV primary mask patterning and stand alone UV lithography


Tyler Morhart
Scientist, Beamline Responsible (SyLMAND)

David Klymyshyn SyLMAND Beamline Advisory Team Leader
Sven Achenbach SyLMAND Beamline Advisory Team Leader

Visit the SyLMAND website for a full list of beamline contacts.

Full Contact List

Garth Wells, Sven Achenbach, David Klymyshyn
L-R: Garth Wells, Sven, and David

Beamline Video

Learn all about our Synchrotron Laboratory for Micro And Nano Devices (SyLMAND) beamline from Tyler Morhart, associate scientist and beamline responsible.


Purchased Access

Purchased access offers quick and accurate solutions to proprietary questions. CLS scientists develop experimental plans based on clients' needs, collect and analyze data, and provide detailed reports with key answers to critical questions.

Learn More

Peer-Reviewed Access

Academic clients can submit proposals through a peer review process. Beam time is granted based on scientific merit, with the expectation that any results will be published. In special cases, rapid access is also available for instrument or beam time.

Proposal Submission