BXDS - Brockhouse Diffraction Sector

BXDS is a suite of three beamlines providing a wide range of complementary diffraction and scattering techniques to characterize the structure of materials.

Spectral Range

BXDS-WLE BXDS-WHE BXDS-IVU
Low Energy Wiggler Beamline
7-22 keV
High Energy Wiggler Beamline
20-94 keV
Undulator Beamline
5-24 keV
brockhouse-beamlines-layout.jpg

Techniques

BXDS-WLE BXDS-WHE BXDS-IVU
Powder Diffraction (PXRD)
PXRD: High Pressure Powder Diffraction
Small Molecule Crystallography
X-ray Diffraction (XRD)
XRD: Grazing Incidence X-ray Diffraction (GIXRD)
XRD: Magnetic Resonant Diffraction ✓*
XRD: Anomalous X-ray Diffraction
XRD: Reciprocal Space Mapping
Small and Wide Angle X-ray Scattering (SAXS/WAXS) ✓*
SAXS: Grazing Incidence Small Angle X-ray Scattering (GISAXS) ✓*
Low Angle X-ray Reflectivity
High Q-space PDF (HQ-PDF)
Diffraction Anomalous Fine Structure (DAFS) ✓* ✓*
X-ray Emission Spectroscopy (XES): Inelastic X-ray Scattering ✓*
* Techniques currently being commissioned
For detailed information about BXDS techniques, visit brockhouse.lightsource.ca.

bxds-data-horiz.png

Samples

The Brockhouse beamlines share several sample environments, including:
  • Cryostream: temperature control from 80-500K
  • Helium Cryostat: enables experiments down to 10K (-263 ºC)
  • High Temperature Flow Cell: temperatures up to 1070K (+800 ºC) with gas flow for capillary format samples
  • Dual-Sample High Temperature Flow Cell: emperatures up to 1273K (+1000 ºC) with gas flow for samples in capillary format (two can be loaded at a time)
  • IBM Endstation: temperatures up to 1000ºC with rapid thermal annealing (RTA), ultra-high purity N2 or He, and in-situ electric resistance probes and roughness measurements, all while measuring XRD.

Visit the BXDS website for more detailed sample information.

bxds-sample-env.jpg

Specifications

 

BXDS-WLE BXDS-WHE BXDS-IVU
CLS Port 04ID-1 04ID-1 04ID-1
Source In-Vacuum Wiggler In-Vacuum Wiggler In-Vacuum Undulator
Resolution ΔE/E, Si (111): 2.8 × 10-4 at 7.1 keV to 6.4 × 10-4 at 15.9 keV.
Si (311): 2.5 × 10-4 at 12.9 keV to 4.5 × 10-4 at 22.5 keV.
Si111, Si422 and Si533 side bounce Laue monochromator 1% (multilayer monochromator) - 0.01% (Si monochromator)
Typical spot sizes Better than 150 μm vertical x 500 μm
~100 μm vertical x 2 - 20 mm horizontal 170 μm Horizontal x 50 μm Vertical
Maximum Photon Flux 1 x 1012 to 5 x 1012 ph/s 1011 - 1014 ph/sec
1011 - 1013 ph/sec

Contacts

Beatriz Moreno Senior Scientist, Beamline Responsible (BXDS)


Visit the BXDS website for a full list of beamline contacts.

Full Contact List

Access

Purchased Access

Purchased access offers quick and accurate solutions to proprietary questions. CLS scientists develop an experimental plan based on the client’s needs, and conduct all data collection and analysis, resulting in a detailed report with key answers to critical questions.

Learn More

Peer-Reviewed Access

Academic clients can submit proposals through a peer review process. Beam time is granted based on scientific merit, with the expectation that any results will be published. In special cases, rapid access is also available for instrument or beam time.

Proposal Submission