BXDS - Brockhouse Diffraction Sector
BXDS is a suite of three beamlines providing a wide range of complementary diffraction and scattering techniques to characterize the structure of materials.
Spectral Range
| BXDS-WLE | BXDS-WHE | BXDS-IVU |
| Low Energy Wiggler Beamline 7-22 keV |
High Energy Wiggler Beamline 20-94 keV |
Undulator Beamline 5-24 keV |
Techniques
| BXDS-WLE | BXDS-WHE | BXDS-IVU | |
| Powder Diffraction (PXRD) | ✓ | ✓ | |
| PXRD: High Pressure Powder Diffraction | ✓ | ||
| X-ray Diffraction (XRD) | ✓ | ✓ | ✓ |
| XRD: Grazing Incidence X-ray Diffraction (GIXRD) | ✓ | ✓ | |
| XRD: Magnetic Resonant Diffraction | ✓* | ||
| XRD: Anomalous X-ray Diffraction | ✓ | ||
| XRD: Reciprocal Space Mapping | ✓ | ||
| Small and Wide Angle X-ray Scattering (SAXS/WAXS) | ✓ | ✓* | |
| SAXS: Grazing Incidence Small Angle X-ray Scattering (GISAXS) | ✓ | ✓* | |
| Low Angle X-ray Reflectivity | ✓ | ✓ | |
| High Q-space PDF (HQ-PDF) | ✓ | ||
| Diffraction Anomalous Fine Structure (DAFS) | ✓* | ✓* | |
| X-ray Emission Spectroscopy (XES): Inelastic X-ray Scattering | ✓* | ||
| * Techniques currently being commissioned |
Samples
- Cryostream: temperature control from 80-500K
- Helium Cryostat: enables experiments down to 10K (-263 ºC)
- High Temperature Flow Cell: temperatures up to 1070K (+800 ºC) with gas flow for capillary format samples
- Dual-Sample High Temperature Flow Cell: emperatures up to 1273K (+1000 ºC) with gas flow for samples in capillary format (two can be loaded at a time)
- IBM Endstation: temperatures up to 1000ºC with rapid thermal annealing (RTA), ultra-high purity N2 or He, and in-situ electric resistance probes and roughness measurements, all while measuring XRD.
Visit the BXDS website for more detailed sample information.
Specifications
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|
BXDS-WLE | BXDS-WHE | BXDS-IVU | |
| CLS Port | 04ID-2 | 04ID-2 | 04ID-1 | |
| Source | In-Vacuum Wiggler | In-Vacuum Wiggler | In-Vacuum Undulator | |
| Resolution | ΔE/E, Si (111): 2.8 × 10-4 at 7.1 keV to 6.4 × 10-4 at 15.9 keV. Si (311): 2.5 × 10-4 at 12.9 keV to 4.5 × 10-4 at 22.5 keV. |
Si111, Si422 and Si533 side bounce Laue monochromator | 1% (multilayer monochromator) - 0.01% (Si monochromator) | |
| Typical spot sizes | Better than 150 μm vertical x 500 μm |
30-50 μm vertical x 100-300 μm horizontal | 170 μm Horizontal x 50 μm Vertical | |
| Maximum Photon Flux | 1 x 1012 to 5 x 1012 ph/s | 1011 - 1013 ph/sec |
|
Contacts
Beatriz Moreno
Senior Scientist, Beamline Responsible (Brockhouse)
Visit the BXDS website for a full list of beamline contacts.
Beamline Video
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Academic clients can submit proposals through a peer review process. Beam time is granted based on scientific merit, with the expectation that any results will be published. In special cases, rapid access is also available for instrument or beam time.