Synchrotron Laboratory for Micro And Nano Devices

Overview

The SyLMAND facility at the Canadian Light Source is dedicated to research in and fabrication of high aspect ratio microstructures.  The X-ray beamline is used to pattern thick polymer resists. The supporting clean room houses facilities for primary UV patterning and fabrication of X-ray masks, seed layer metallization, wet chemical processing, gold and nickel electroplating, inspection and metrology.  A large variety of devices can be fabricated in different applications such as micro-electric-mechanical systems (MEMS), biomedical and optics/photonics.

  • Status

    Accepting Proposals

  • BEAM SIZE (HORIZONTAL X VERTICAL)

    150 mm x 15 mm

  • BEAM POWER

    700 W

  • WAVELENGTH

    12.4 – 0.82 Å

  • ENERGY RANGE

    1 – 15 keV

  • SOURCE

    Bending Magnet

Endstation(s):

Dedicated X-ray scanner for full-wafer exposure under vacuum including capabilities for inclined and aligned exposures.
 

Techniques:

  • Deep X-ray lithography
  • LIGA process lithography steps

Contacts

Scientist – Beamline Responsible: Garth Wells 306-657-3736

Associate Scientist: Michael Jacobs 306-657-3799
Beam Team Leaders:

  • David Klymyshyn
  • Sven Achenbach
Beamline Telephone: 306-657-3617
 

SyLMAND Capabilities

Polymer microfabrication capabilities:
  • Polymer: Poly methyl methacrylate (PMMA) (Molecular weight = 1.6M )
  • Minimum Feature size: > Dependent on design and polymer thickness.
  • Polymer thickness: 100 µm to 1 mm
  • X-ray Mask: Mask fabrication from CAD design is possible.
    Note: Possibility to combine similar aspect ratio layouts onto a mask to reduce cost. Please discuss with Beamline Scientist to explore this possibility.
  • Standard mask layout area: 75mm Diameter
Cleanroom capabilities:
  • Titanium seed layer application on substrate by sputtering
  • PMMA application and customization of thickness
  • Post-exposure development
  • Inspection and imaging capabilities (optical and scanning electron microscopes with measurement tools)
  • Metrology (Surface profiling and Z-tip)
  • UV primary mask patterning and stand alone UV lithography
 
  • SyLMAND beamline optics section (upstream) with custom built double mirror & beam positioning system and differential pumping /vacuum isolation window section

  • Left to Right: Garth Wells, Sven Achenbach, David Klymyshyn

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