| Overview |
Status |
Operational, Accepting
Proposals |
Source |
185 mm planar undulator |
Energy Range |
5.5 – 250 eV |
Wavelength |
2254 – 49.6Å |
Resolution |
>10,000 E/ΔE |
Flux ( γ /s/0.1%BW) @ 100 mA |
2 x 1011 @ 9 - 240eV & 50 x 50 μm slits |
Spot size (Horizontal x Vertical) |
500 μm x 500 μm |
Description: This facility shares a straight section with the high resolution SGM; after traveling through a specially designed shared vessel, the two beams enter separate vacuum enclosures. There are three gratings to cover the entire energy range. Two parallel endstations are available.
Endstation(s):
- Photoemission Electron Microscopy (PEEM)
- Absorption Chamber
- Gas Phase Systems
- Time of Flight
- Toroidal Photoelectron Spectrometer
- Photoemission Chamber
Techniques:
- X-ray Absorption Spectroscopy (XAS)
- X-ray Excited Optical Luminescence (XEOL)
- Photoemission Electron Microscopy (PEEM)
- X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES)
Technical beamline one-pager (PDF)
|
Left to right: Chris Ryan, Lucia Zuin, Mike MacDonald
|
|
| Contacts |
Beamline Scientist: Lucia
Zuin (306) 657-3724
Beamline Team Leader: T.K.
Sham
Beamline Team Leader PDF
Beamline Telephone: (306) 657-3608
|
Last modified: 2010-07-30 13:07:01
