| Overview |
Status |
Operational, Accepting
Proposals |
Source |
185 mm planar undulator |
Energy Range |
5.5 – 250 eV |
Wavelength |
2254 – 49.6Å |
Resolution |
>10,000 E/ΔE |
Flux ( γ /s/0.1%BW) @ 100 mA |
2 x 1012 @ 80 eV |
Spot size (Horizontal x Vertical) |
500 μm x 500 μm |
Description: This facility shares a straight section with the high resolution SGM; after traveling through a specially designed shared vessel, the two beams enter separate vacuum enclosures. There are three gratings to cover the entire energy range. Two parallel endstations are available.
Endstation(s):
- Photoemission Electron Microscopy (PEEM)
- Absorption Chamber
- Gas Phase Systems
Techniques:
- X-ray Absorption Spectroscopy (XAS)
- X-ray Excited Optical Luminescence (XEOL)
- Photoemission Electron Microscopy (PEEM)
Technical beamline one-pager (PDF)
|
Left to Right: T.K. Sham; Lucia Zuin; Yongfeng Hu
|
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| Contacts |
Beamline Scientist: Lucia
Zuin (306) 657-3724
Beamline Team Leader: T.K.
Sham
Beamline Team Leader PDF
Beamline Telephone: (306) 657-3608
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Last modified: 2009-12-17 11:12:10
