Description: SyLMAND will be dedicated to research in and fabrication of polymer microstructures. The combination with subsequent process steps, such as metallization of the polymer templates, allows a huge variety of micro-electro-mechanical systems (MEMS) applications in fields such as radio frequency MEMS, micromechanics, optics/photonics and biomedical. The SyLMAND facility will consist of a dedicated beamline as well as a process support cleanroom laboratories required to run the individual process steps.

Endstation(s):

• Dedicated X-ray scanner for full-wafer exposure under vacuum including capabilities for inclined and aligned exposures.

Techniques:

• Deep X-ray lithography
• LIGA process lithography steps

Upcoming Events:

• HARMST 2009 (June 25-28, 2009)

Technical beamline one-pager (PDF)

Left to Right: David Klymyshyn, Sven Achenbach, Venkat Subramanian