| Overview |
|
XAFS Endstation |
Microprobe Endstation |
Status |
Operational,
Accepting Proposals
|
Under Construction |
Source |
Bending Magnet |
Bending Magnet |
Energy Range |
1.7 – 10 keV |
1.7 – 10 keV |
Wavelength |
7.3 – 1.3 Å |
7.3 – 1.3 Å |
Resolution Δ E / E @ E |
3.3 x 10-4 Insb (111)
1 x 10-4 Si (111)
|
3.3 x 10-4 Insb (111)
1 x 10-4 Si (111) |
Flux ( γ /s/0.1%BW) @ 100 mA |
>1 x 1011 |
1 x 109 |
Spot size (Horizontal x Vertical) |
300 μm x 300 μm |
~ 10 μm x 10 μm |
Description: A medium energy, bending magnet based beamline for XAFS and micro analysis of various materials.
Techniques:
- X-ray Absorption Spectroscopy
- Microprobe
- X-ray Excited Optical Luminescence (XEOL)
- Resonant spectroscopies
- X-ray Magnetic Linear Dichroism (XMLD)
- Photo Emission Electron Microscopy (PEEM)
- X-ray Magnetic Circular Dichroism (XMCD)
- Photo and Auger Electron Spectroscopy
Optics: pre mono collimating mirror; interchangeable Insb(111) and Si(111) crystals; post mono Toroidal mirror for XAFS station or KB system for microprobe station.
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| Contacts |
Beamline Scientist: Yongfeng Hu (306) 657-3722
Beamline Team Leader: T.K.Sham
Beamline Team Members (PDF)
Beamline Telephone: (306) 657-3614 |
Last modified: 2009-07-31 15:07:11
