Beamlines

Beamlines

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Techniques

Energy (eV) (cm-1 for IR)

Status

APS – Beamline 20-ID-B,C: Sector 20 – Insertion Device

• Micro-XRD
• X-ray Absorption Fine Structure (XAFS)
• Resonant X-ray Emission Spectroscopy
• X-ray Raman Scattering
• Confocal X-ray Microscopy
• Micro-fluorescence
• Time-resolved X-ray Absorption Fine Structure
• X-ray Emission Spectroscopy (commissioning)
4.3 – 2.7 keV (Si111)
8 – 50 keV (Si311)
  • Operational
  • Accepting Proposals

APS – Beamline 20-BM-B: Sector 20 – Bending Magnet

• X-ray Absorption Fine Structure (XAFS)
• Microfluorescence (Hard X-ray)
• Time-resolved X-ray Excited Optical Luminescence
• Diffraction Anomalous Fine Structure
2.7 – 32.7 keV
  • Operational
  • Accepting Proposals

APS – Other Beamlines

Beamlines include all XSD beamlines at the APS – please contact the PNCSRF beamline scientist for more information
various
  • Operational
  • Accepting Proposals

Biomedical Imaging and Therapy (BMIT-BM)
05B1-1

• Conventional absorption imaging
• Phase contrast or in-line holography
• Ultra-small, small, wide angle scattering imaging
• Computer Tomography (CT)
• Diffraction Enhanced Imaging (DEI) / Multiple Image Radiography (MIR)

Critical Points to Address in a BMIT proposal
8000 – 40000

Biomedical Imaging and Therapy (BMIT-ID)
05ID-2 (POE-2 & SOE-1)

• Imaging - conventional absorption imaging, DEI / MIR, CT, K-edge Subtraction (KES)
• Therapy - Microbeam Radiation Therapy, CT Therapy

Critical Points to Address in a BMIT proposal
20000 – 100000

Canadian Macromolecular Crystallography Facility (CMCF-BM)
08B1-1

• Single Anomalous Dispersion (SAD)
• X-ray diffraction
• Multiwavelength Anomalous Dispersion (MAD)
• XANES on crystals
4000 to 18000

Canadian Macromolecular Crystallography Facility (CMCF-ID)
08ID-1

• Single crystal X-ray diffraction
• Multiwavelength Anomalous Dispersion (MAD)
• XANES on crystals
6200 – 18000

Far Infrared Spectroscopy
(Far-IR)

02B1-1

• Fourier Transform Absorption Spectroscopy
0.00062 - 0.124 eV
(0.62 - 124 meV = 5 - 1000 cm-1)

Hard X-ray MicroAnalysis (HXMA)
06ID-1

• X-ray Absorption Fine Structure (XAFS)
• Microprobe
• Powder Diffraction
• X-ray Scattering
5000 – 40000

High Resolution Spherical Grating Monochromator (SGM)
11ID-1

• X-ray Absorption Spectroscopy (XAS)
• X-ray Photoelectron Spectroscopy (XPS)
• Auger Electron Spectroscopy (AES)
• X-ray Excited Optical Luminescence (XEOL)
• Gas phase photoionization
• TOF measurements
240 - 2000

Mid Infrared Spectromicroscopy (Mid-IR)
01B1-1

• Spectromicroscopy at diffraction-limited spatial resolution
• Photoacoustic Spectroscopy
• Polarization Modulation IR Spectromicroscopy
• Focal Plane Array (FPA) Microscopy for large area mapping


Techniques under Development:
•Spectromicroscopy at grazing angle of incidence
•Spectromicroscopy with Attenuated Total internal Reflection (ATR)

Critical Points to Address in a Mid-IR Proposal
0.070 - 0.744 eV
(70 - 744 meV = 560 - 6000 cm-1)

Resonant Elastic and Inelastic X-ray Scattering (REIXS)
10ID-2

• X-ray Absorption Spectroscopy (XAS)
• X-ray Emission Spectroscopy (commissioning)
• Resonant Inelastic X-ray Scattering (commissioning)
• Resonant Elastic X-ray Scattering
• Magnetic X-ray Dichroism
• Molecular Beam Epitaxy sample preparation

Critical Points to Address in a REIXS proposal
80 – 2000

Soft X-ray Microcharacterization Beamline (SXRMB)
06B1-1

• X-ray Absorption Spectroscopy (XAS)
• X-ray Excited Optical Luminescence (XEOL)
• X-ray Magnetic Linear Dichroism (XMLD)
• Photoemission Electron Microscopy (PEEM)
• X-ray Magnetic Circular Dichroism (XMCD)
• Resonant spectroscopies
• Photo and Auger Electron Spectroscopy
• X-ray Absorption Fine Structure (XAFS)
1700 – 10000

Soft X-ray Spectromicroscopy (SM)
10ID-1

• Photoemission Electron Microscopy (PEEM)
• Scanning transmission X-ray Microscopy (STXM)
• Circular Polarization: 130 — 1000 eV
• Linear Polarization: 130 — 2500 eV

Critical Points to Address in an SM proposal
130 – 2500

Synchrotron Laboratory for Micro And Nano Devices (SyLMAND)
05B2-1

• Deep X-ray lithography
• LIGA process lithography steps
1000 – 15000

Variable Line Spacing Plane Grating Monochromator (VLS PGM)
11ID-2

• X-ray Absorption Spectroscopy (XAS)
• X-ray Excited Optical Luminescence (XEOL)
• Photoemission Electron Microscopy (PEEM)
• X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES)
• Time of Flight (TOF) and gas phase photoionization measurements
5.5 – 250

Very Sensitive Elemental and Structural Probe Employing Radiation from a Synchrotron (VESPERS)
07B2-1

• X-ray Laue Diffraction
• X-ray Fluorescence Spectroscopy
• X-ray Absorption Near Edge Structure
• Differential Aperture X-ray Microscopy
• Multi-bandpass and pink beam capability
6000 – 30000

Last modified: 2013-05-03 16:05:59