Synchrotron Laboratory for Micro And Nano Devices (SyLMAND) 05B2-1

Overview

The SyLMAND facility at the Canadian Light Source is dedicated to research in and fabrication of high aspect ratio microstructures.  The X-ray beamline is used to pattern thick polymer resists. The supporting clean room houses facilities for primary UV patterning and fabrication of X-ray masks, seed layer metallization, wet chemical processing, gold and nickel electroplating, inspection and metrology.  A large variety of devices can be fabricated in different applications such as micro-electric-mechanical systems (MEMS), biomedical and optics/photonics.

  • Status

    Accepting Proposals

  • BEAM SIZE (HORIZONTAL X VERTICAL)

    150 mm x 15 mm

  • BEAM POWER

    700 W

  • WAVELENGTH

    12.4 – 0.82 Å

  • ENERGY RANGE

    1 – 15 keV

  • SOURCE

    Bending Magnet

Endstation(s):

Dedicated X-ray scanner for full-wafer exposure under vacuum including capabilities for inclined and aligned exposures.
 

Techniques:

  • Deep X-ray lithography
  • LIGA process lithography steps

Contacts

Scientist – Beamline Responsible: Garth Wells (306) 657-3736

Associate Scientist: Michael Jacobs (306) 657-3799
Beamline Team Leaders:

  • David Klymyshyn
  • Sven Achenbach
Beamline Telephone: (306) 657-3617

  • SyLMAND beamline optics section (upstream) with custom built double mirror & beam positioning system and differential pumping /vacuum isolation window section

  • Left to Right: Garth Wells, Sven Achenbach, David Klymyshyn

how can we help?

If you’re looking for information on how you can use CLS techniques in your research program, please contact us using this form.

Example queries may include: Feasibility around a potential experiment? A scientific problem we can help you solve? Is your question related to a specific technique? Do you want to know more about how to apply for beamtime?

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